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半導體中心-英文

Equipment List

📘 Photolithography 

Equipment Name

Location

Contact Window

E-beam Lithography (EBL)📎

CRE 2F Cleanroom

Advanced Lithography Area

Dr. Chia-Yang Tsai

I-Line Stepper

CRE 2F Cleanroom

Advanced Lithography Area

Dr. Chih-Hao Chiang

📘 Thin Film Deposition

Equipment Name

Location

Contact Window

Plasma-Enhanced Atomic Layer Deposition System (PEALD) 📎

CRE 2F Cleanroom

CVD Area

Dr. Chia-Yang Tsai

Thermal Atomic Layer Deposition System (Thermal ALD)📎

CRE 2F Cleanroom

CVD Area

Dr. Chia-Yang Tsai

Plasma-Enhanced Chemical Vapor Deposition System (PECVD)📎

CRE 2F Cleanroom

CVD Area

Dr. Chia-Yang Tsai

UHV Sputter📎

CRE 2F Cleanroom

PVD Area

Dr. Chih-Hao Chiang

UHV E-Beam Evaporator📎

CRE 2F Cleanroom

PVD Area

Dr. Chih-Hao Chiang

📘 Dry Etching

Equipment Name

Location

Contact Window

Inductively Coupled Plasma-Reactive Ion Etching System (ICP-RIE)📎

CRE 2F Cleanroom

Dry Etch Area

Dr. Chia-Yang Tsai

📘 Measurement & Analysis

Equipment Name

Location

Contact Window

Semiconductor Device Parameter Analyzer 📎

CRE 2F Cleanroom

Measurement & Analysis Area

Dr. Chih-Hao Chiang

 

📎 is a key piece of equipment. Both OEM service requests and self-operation must be reserved through the “Chip Driven – Taiwan Semiconductor Resource Sharing Platform” (see related links below).